Leuven, Belgium

Alexandre Halbach

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Asml Netherlands B.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexandre Halbach. Retrieved from https://idiyas.com/inventor/alexandre-halbach-0iaq3hy6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Alexandre Halbach

Introduction

Alexandre Halbach is a notable inventor based in Leuven, Belgium. He is recognized for his contributions to the field of micromirror technology, which has significant applications in various optical systems.

Latest Patents

Halbach holds a patent for micromirror arrays. This innovative design includes a substrate and a plurality of mirrors that reflect incident radiation. Each mirror is connected to the substrate by a respective post. The micromirror array features electrostatic actuators that apply force to the posts, allowing for the displacement of the mirrors. This technology can be utilized in programmable illuminators, which are essential in lithographic and inspection apparatuses.

Career Highlights

Throughout his career, Halbach has worked with prominent companies such as ASML Netherlands B.V. and imec Vzw. His experience in these organizations has contributed to his expertise in the development of advanced optical technologies.

Collaborations

Halbach has collaborated with talented individuals in his field, including Nitesh Pandey and Sebastianus Adrianus Goorden. These partnerships have fostered innovation and advancement in micromirror technology.

Conclusion

Alexandre Halbach's work in micromirror arrays exemplifies the intersection of innovation and practical application in optical systems. His contributions continue to influence the development of advanced technologies in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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