Vourey, France

Alexandre Bes

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):Explore Patents

Title: Innovations of Alexandre Bes

Introduction

Alexandre Bes is an accomplished inventor based in Vourey, France. He has made significant contributions to the field of plasma technology, holding two patents that showcase his innovative approach to cleaning devices and plasma confinement.

Latest Patents

His latest patents include a "Cleaning device and cleaning process for a plasma reactor." This invention involves a device that utilizes a dry chemical means assisted by plasma to clean unwanted deposits from reactor walls and polarizable surfaces. The device is characterized by its ability to positively polarize these surfaces relative to the reactor walls, which are maintained at a reference potential.

Another notable patent is the "Device and method for producing and/or confining a plasma." This invention features a chamber where plasma is produced and confined. The chamber includes a wall that defines a housing, and it comprises assemblies for producing and confining plasma. Each assembly consists of magnets with an axial magnetization direction, ensuring that the magnetic field lines do not extend through the chamber wall.

Career Highlights

Alexandre Bes has worked with prestigious institutions such as the Centre National de la Recherche Scientifique and Université Joseph Fourier-Grenoble 1. His work in these organizations has contributed to advancements in research and technology related to plasma applications.

Collaborations

He has collaborated with notable colleagues, including Jacques Henri Pelletier and Ana Lacoste, further enhancing his contributions to the field.

Conclusion

Alexandre Bes is a prominent inventor whose work in plasma technology has led to innovative solutions in cleaning and confinement processes. His patents reflect a deep understanding of the complexities involved in plasma applications, marking him as a significant figure in his field.

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