The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jun. 24, 2014
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
Universite Joseph Fourier—grenoble 1, St. Martin d'Heres, FR;
Jacques Henri Pelletier, Saint Martin d'Heres, FR;
Ana Lacoste, Saint Martin le Vinoux, FR;
Alexandre Bes, Vourey, FR;
Stephane Jean Louis Bechu, Chantesse, FR;
Jerome Sirou, Grenoble, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), Paris, FR;
UNIVERSITE JOSEPH FOURIER—GRENOBLE 1, St. Martin d'Heres, FR;
Abstract
The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor () containing an unwanted deposit on its walls and at least one other polarizable surface (), characterized in that it comprises means () for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.