Chantesse, France

Stephane Jean Louis Bechu

This inventor holds 1 USPTO granted patent. Top assignees: Centre National De La Recherche Scientifique, University Joseph Fourier (Grenoble 1). Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stephane Jean Louis Bechu. Retrieved from https://idiyas.com/inventor/stephane-jean-louis-bechu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Stephane Jean Louis Bechu

Introduction

Stephane Jean Louis Bechu is a notable inventor based in Chantesse, France. He has made significant contributions to the field of cleaning devices, particularly in the context of plasma reactors. His innovative approach combines advanced technology with practical applications, showcasing his expertise in engineering and invention.

Latest Patents

One of Bechu's key inventions is a cleaning device and cleaning process for a plasma reactor. This invention addresses the challenge of unwanted deposits on the walls of reactors. The device utilizes a dry chemical means assisted by plasma, which is characterized by its ability to positively polarize one or more surfaces relative to the reactor walls maintained at a reference potential. This innovative approach enhances the efficiency of cleaning processes in plasma reactors.

Career Highlights

Throughout his career, Bechu has worked with esteemed institutions such as the University Joseph Fourier (Grenoble 1) and the Centre National de la Recherche Scientifique. His work in these organizations has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research and development.

Collaborations

Bechu has collaborated with notable colleagues, including Ana Lacoste and Alexandre Bes. These partnerships have enriched his work and fostered an environment of innovation and creativity.

Conclusion

Stephane Jean Louis Bechu's contributions to the field of cleaning devices for plasma reactors exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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