The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Oct. 28, 2009
Jacques Pelletier, Saint Martin d'Heres, FR;
Stéphane Bechu, Chantesse, FR;
Alexandre Bes, Vourey, FR;
Ana Lacoste, Saint Martin le Vinoux, FR;
Jacques Pelletier, Saint Martin d'Heres, FR;
Stéphane Bechu, Chantesse, FR;
Alexandre Bes, Vourey, FR;
Ana Lacoste, Saint Martin le Vinoux, FR;
Abstract
The invention relates to a device for producing and/or confining a plasma, said device comprising a chamber in the space of which the plasma is produced and/or confined, said chamber including a wall defining a housing inside the chamber and encompassing said space, wherein said device is characterized in that it comprises at least one assembly for producing and/or confining plasma, each assembly being composed of magnets having only an axial magnetization direction and being recessed in the wall defining the housing, so that the magnetization direction of all the magnets defining each assembly is substantially perpendicular to the housing defined by the wall and so that the assembly is substantially symmetrical to the housing, wherein the magnetic field lines do not extend through the wall of the chamber. The invention also relates to a method for producing and/or confining a plasma.