Centre National De La Recherche Scientifique

Université Joseph Fourier - Grenoble 1

Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Université Grenoble Alpes

Institut Polytechnique De Grenoble

Alexandre Bes

Jacques Henri Pelletier

Ana Lacoste

Stéphane Bechu

Jerome Sirou

Stephane Jean Louis Bechu

Stéphane Jean Louis Bechu

Jérôme Sirou

Fabien Ozanne

The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor () containing an unwanted deposit on its walls and at least one other polarizable surface (), characterized in that it comprises means () for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.

Cleaning device and cleaning process for a plasma reactor

The invention relates to a device for producing and/or confining a plasma, said device comprising a chamber in the space of which the plasma is produced and/or confined, said chamber including a wall defining a housing inside the chamber and encompassing said space, wherein said device is characterized in that it comprises at least one assembly for producing and/or confining plasma, each assembly being composed of magnets having only an axial magnetization direction and being recessed in the wall defining the housing, so that the magnetization direction of all the magnets defining each assembly is substantially perpendicular to the housing defined by the wall and so that the assembly is substantially symmetrical to the housing, wherein the magnetic field lines do not extend through the wall of the chamber. The invention also relates to a method for producing and/or confining a plasma.

Device and method for producing and/or confining a plasma

Growing community of inventors

Vourey, France

Alexandre Bes