Alexander Kadyshevitch

This inventor holds 11 USPTO granted patents. Top assignees: Applied Materials Israel Limited, Applied Materials, Inc.. Active years: 2002-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexander Kadyshevitch. Retrieved from https://idiyas.com/inventor/alexander-kadyshevitch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 63.6

Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 99(Granted Patents)

Location History:

Modiin, IL (2002 - 2009)
Hoddieen, IL (2007 - 2009)
Moddieen, IL (2004 - 2010)

Company Filing History:

9 out of 572

Applied Materials Israel Limited

patents

2 out of 14,454

Applied Materials, Inc.

patents

Years Active: 2002-2010

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7842933 - System and method for measuring overlay errors (2010-11-30),

2. 7602197 - High current electron beam inspection (2009-10-13),

3. 7476875 - Contact opening metrology (2009-01-13),

4. 7473911 - Specimen current mapper (2009-01-06),

5. 7381978 - Contact opening metrology (2008-06-03),

6. 7279689 - Contact opening metrology (2007-10-09),

7. 7170056 - Methodology and apparatus for leakage detection (2007-01-30),

8. 7078690 - Monitoring of contact hole production (2006-07-18),

9. 7038224 - Contact opening metrology (2006-05-02),

10. 6781126 - Auger-based thin film metrology (2004-08-24),

11. 6407386 - System and method for automatic analysis of defect material on semiconductors (2002-06-18),

Title: Innovations of Alexander Kadyshevitch

Introduction

Alexander Kadyshevitch is a notable inventor based in Moddieen, IL, with a remarkable portfolio of 11 patents. His work primarily focuses on advanced systems and methods for measuring overlay errors and inspecting semiconductor wafers. His contributions have significantly impacted the field of semiconductor manufacturing and inspection technologies.

Latest Patents

Among his latest patents, Kadyshevitch has developed a "System and method for measuring overlay errors." This innovative method involves directing a primary electron beam to interact with an inspected object, which includes features formed on different layers. The method effectively detects overlay errors by analyzing the electrons reflected or scattered from the inspected area. Another significant patent is the "High current electron beam inspection," which describes a method and apparatus for wafer inspection. This apparatus is designed to test samples with conductive and dielectric layers, utilizing a high current beam of charged particles to inspect multiple contact openings simultaneously.

Career Highlights

Kadyshevitch has had a distinguished career, working with leading companies in the semiconductor industry. He has been associated with Applied Materials Israel Limited and Applied Materials, Inc., where he has contributed to the development of cutting-edge technologies in semiconductor manufacturing.

Collaborations

Throughout his career, Kadyshevitch has collaborated with talented professionals, including Dmitry Shur and Chris Talbot. These collaborations have fostered innovation and advancements in the technologies he has worked on.

Conclusion

Alexander Kadyshevitch's contributions to the field of semiconductor technology through his patents and collaborations highlight his significant role as an inventor. His innovative methods for measuring overlay errors and inspecting wafers continue to influence the industry.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]