Santa Clara, CA, United States of America

Alex Schreiber


Average Co-Inventor Count = 5.7

ph-index = 9

Forward Citations = 2,526(Granted Patents)


Location History:

  • Santa Clara, CA (US) (1996 - 2001)
  • San Jose, CA (US) (1999 - 2002)

Company Filing History:


Years Active: 1996-2002

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9 patents (USPTO):Explore Patents

Title: Alex Schreiber: Innovator in Substrate Processing Technology

Introduction

Alex Schreiber is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of substrate processing systems, holding a total of 9 patents. His work focuses on enhancing the efficiency and effectiveness of fluid distribution in various applications.

Latest Patents

Among his latest patents is the Gas Distribution Plate, which is an apparatus designed for use in substrate processing systems. This innovative fluid distribution plate consists of an inner disk and an outer ring, featuring a plurality of openings for optimal fluid distribution and at least one defined slot. Another notable patent is related to the Plasma Treatment of Titanium Nitride formed by chemical vapor deposition. This method involves depositing titanium nitride in a chamber with specific design features that address the conductive nature of titanium nitride, particularly during a plasma treatment step following the thermal deposition of the film.

Career Highlights

Alex Schreiber is currently employed at Applied Materials, Inc., where he continues to push the boundaries of technology in substrate processing. His expertise and innovative mindset have led to advancements that benefit the industry significantly.

Collaborations

Throughout his career, Alex has collaborated with talented individuals such as Jun Zhao and Charles N Dornfest. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

In summary, Alex Schreiber is a distinguished inventor whose work in substrate processing technology has resulted in multiple patents and significant advancements in the field. His contributions continue to shape the future of technology in this area.

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