Company Filing History:

4 out of 3,715

Lsi Logic Corporation

patents

2 out of 3,768

Lam Research Corporation

patents

1 out of 3,544

Cypress Semiconductor Corporation

patents

Years Active: 2002-2012

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7 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8313580 - Method for processing a substrate using a single phase proximity head having a controlled meniscus (2012-11-20),

2. 7997288 - Single phase proximity head having a controlled meniscus for treating a substrate (2011-08-16),

3. 7351663 - Removing whisker defects (2008-04-01),

4. 6641698 - Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow (2003-11-04),

5. 6461972 - Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow (2002-10-08),

6. 6346490 - Process for treating damaged surfaces of low k carbon doped silicon oxide dielectric material after plasma etching and plasma cleaning steps (2002-02-12),

7. 6346488 - Process to provide enhanced resistance to cracking and to further reduce the dielectric constant of a low dielectric constant dielectric film of an integrated circuit structure by implantation with hydrogen ions (2002-02-12),

Title: Alex Kabansky: Innovator in Substrate Processing Technology

Introduction

Alex Kabansky is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of substrate processing, holding a total of seven patents. His innovative methods and systems have advanced the technology used in various applications.

Latest Patents

Among his latest patents is a method for processing a substrate using a single phase proximity head having a controlled meniscus. This method involves generating a controlled meniscus with a proximity head that has a face in close proximity to the substrate's surface. The process includes delivering a chemical through discrete nozzles in the proximity head, allowing for precise control over the chemical application. Another notable patent describes a system for processing a substrate that includes a proximity head, a mechanism, and a liquid supply. This system is designed to maintain a thin layer of liquid on the substrate's surface while balancing the delivery and removal of the liquid.

Career Highlights

Throughout his career, Alex has worked with prominent companies such as LSI Logic Corporation and Lam Research Corporation. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Alex has collaborated with several professionals in his field, including Mike Ravkin and John Martin De Larios. These collaborations have further enriched his work and innovations.

Conclusion

Alex Kabansky's contributions to substrate processing technology through his patents and career experiences highlight his role as a significant innovator in the industry. His work continues to influence advancements in this field.

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