Woodridge, IL, United States of America

Alex B F Martinson

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Uchicago Argonne, LLC. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alex B F Martinson. Retrieved from https://idiyas.com/inventor/alex-b-f-martinson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 6 

% Patents Active = 83.3

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Evanston, IL (US) (2010 - 2012)
  • Woodridge, IL (US) (2014 - 2018)

Company Filing History:


Years Active: 2010-2026

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Inventor Alex B. F. Martinson

Introduction

Alex B. F. Martinson, based in Woodridge, Illinois, is a prominent inventor known for his contributions to the field of atomic layer deposition (ALD) technology. With a total of five patents to his name, Martinson is recognized for his innovative approaches that address significant challenges in material sciences and thin-film technology.

Latest Patents

Martinson's most recent patents showcase his expertise and commitment to advancing ALD processes. One notable invention is the "Micro-balance sensor integrated with atomic layer deposition chamber." This invention focuses on the development of a Quartz Crystal Microbalance (QCM) fixture, which facilitates precise QCM measurements during ALD processes. By overcoming barriers associated with accurate execution within ALD methodologies, this device is designed for routine characterization in various ALD tools, streamlining sample exchange while minimizing footprint and flow disturbance. Furthermore, the rapid thermal equilibration of this QCM design allows for temperature-dependent studies and ex situ sample exchange, making it a valuable asset for day-to-day operations.

Another significant patent by Martinson is related to "Atomic layer deposition of metal sulfide thin films using non-halogenated precursors." This innovative method introduces a process for creating metal sulfide thin films through ALD, which utilizes a metal precursor and a sulfur compound to deposit a thin film on a substrate. One highlighted application includes the preparation of a CuS film using Bis(N,N'-di-sec-butylacetamidinato)dicopper(I) and hydrogen sulfide (HS). This discovery opens new possibilities for photovoltaic devices, potentially using more abundant materials for energy production.

Career Highlights

Martinson is currently affiliated with the University of Chicago Argonne, LLC, where he continues to expand the boundaries of scientific research within the field of atomic layer deposition. His career is marked by a relentless pursuit of innovation, leading to advancements that significantly impact both academic and industrial applications in thin film technologies.

Collaborations

Throughout his career, Martinson has collaborated with esteemed colleagues such as Jeffrey W. Elam and Michael J. Pellin. These partnerships have fostered an environment of creativity and innovation, encouraging the exploration of new methodologies and technologies within the industry.

Conclusion

In conclusion, Alex B. F. Martinson stands out as a significant figure in the realm of inventions related to atomic layer deposition. His five patents not only address substantial challenges in the field but also pave the way for novel applications in material sciences. As research continues to evolve, Martinson's contributions will undoubtedly play a vital role in shaping the future of technological advancements in thin film processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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