This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Kla Corporation, Kla Tencor Corporation. Active years: 2018-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018-2021
Title: Innovations of Alessandro Vaglio Pret
Introduction
Alessandro Vaglio Pret is an accomplished inventor based in Austin, TX (US). He has made significant contributions to the field of technology, particularly in the area of photoresist development and stochastic simulations. With a total of 2 patents, his work has had a notable impact on the industry.
Latest Patents
Alessandro's latest patents include "Stochastic Reticle Defect Dispositioning" and "Method for Computer Modeling and Simulation of Negative-Tone-Developable Photoresists." The first patent discloses a system that includes a controller with processors and memory, which acquires product metrology data and performs stochastic simulations to generate simulated product samples. This innovation aims to identify care areas on product reticles that are susceptible to printing stochastic defects. The second patent focuses on improving the development process of a photoresist by simulating a negative-tone development process. It involves determining the reaction of a developer with a soluble photoresist surface and optimizing the illumination source and mask on a full chip.
Career Highlights
Throughout his career, Alessandro has worked with notable companies such as KLA Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.
Collaborations
Alessandro has collaborated with esteemed colleagues, including John Joseph Biafore and Mark Davis Smith. These partnerships have fostered innovation and have been instrumental in the development of his patents.
Conclusion
Alessandro Vaglio Pret is a prominent inventor whose work in stochastic simulations and photoresist development has made a significant impact on the technology sector. His contributions continue to influence advancements in the field, showcasing the importance of innovation in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

