This inventor holds 1 USPTO granted patent. Top assignee: Axcelis Technologies, Inc.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Alec S. Denholm: Innovator in Plasma Immersion Ion Implantation
Introduction
Alec S. Denholm is a notable inventor based in Lincoln, MA (US). He has made significant contributions to the field of plasma immersion ion implantation, a technology that plays a crucial role in semiconductor manufacturing. With a focus on improving processes, Denholm has been awarded a patent for his innovative methods.
Latest Patents
Denholm's most recent patent is titled "Pretreatment process for plasma immersion ion implantation." This patent describes a method for use with plasma immersion ion implantation systems. The process involves ionizing a first gas in a chamber to produce electrically inactive ions. These ions react with a patterned photoresist on a substrate, leading to outgassing. The outgassed material is continuously evacuated until the outgassing is substantially completed. The method also includes ionizing a second gas to produce electrically active ions, which are then implanted into the substrate. Additionally, the patent discloses a method for curing the photoresist prior to ion implantation, ensuring that the photoresist outgassing is minimized.
Career Highlights
Alec S. Denholm is currently employed at Axcelis Technologies, Inc., where he continues to develop innovative solutions in the field of ion implantation. His work has been instrumental in advancing the technology used in semiconductor fabrication. Denholm's expertise and dedication to his craft have earned him recognition within the industry.
Collaborations
Denholm collaborates with various professionals in his field, including his coworker, Peter Lawrence Kellerman. Their combined efforts contribute to the ongoing advancements in plasma immersion ion implantation technology.
Conclusion
Alec S. Denholm's contributions to the field of plasma immersion ion implantation highlight his innovative spirit and commitment to technological advancement. His patent for a pretreatment process showcases his ability to enhance existing methods, making a significant impact in the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
