This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Akito Kouchi: Innovator in Plasma Processing Technology
Introduction
Akito Kouchi is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing, particularly in the development of methods that enhance the precision of etching processes in semiconductor manufacturing.
Latest Patents
Kouchi holds a patent for a plasma processing method that addresses critical challenges in the formation of trenches with a mask having a minimum opening width of 20 nm or less. This innovative method is designed to suppress sideetching and microloading during plasma etching. The process involves forming trenches through plasma etching, applying a nitride film on the sidewalls of the trenches using plasma, and subsequently forming an oxide film on the sidewalls and bottom surfaces of the trenches.
Career Highlights
Kouchi is associated with Hitachi High-Technologies Corporation, where he has been instrumental in advancing plasma processing technologies. His work has been pivotal in improving the efficiency and accuracy of semiconductor fabrication processes.
Collaborations
Some of Kouchi's notable coworkers include Hiroaki Ishimura and Hayato Watanabe, who have collaborated with him on various projects within the field of plasma processing.
Conclusion
Akito Kouchi's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His work continues to influence the semiconductor industry, paving the way for advancements in manufacturing techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile