Kyoto, Japan

Akito Hatano

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2016-2023

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13 patents (USPTO):Explore Patents

Title: Akito Hatano: Innovator in Substrate Processing Technology

Introduction

Akito Hatano is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 13 patents. His innovative designs and solutions have advanced the capabilities of substrate processing devices, making them more efficient and effective.

Latest Patents

Among his latest patents, Hatano has developed a substrate processing apparatus that features a supply flow passage branching into multiple upstream flow passages. This design includes a branching upstream flow passage that further divides into several downstream flow passages. The apparatus is equipped with multiple discharge ports that release processing liquids onto the upper surface of a substrate held by a substrate holding unit. Another notable invention is a substrate processing device that incorporates a heater positioned between the substrate and the spin base. This device includes a spin base that transmits drive force from a spin motor to chuck members, along with a nozzle for supplying processing fluid to the substrate. The heating mechanism utilizes an IH circuit to generate heat through an alternating magnetic field, enhancing the processing capabilities of the device.

Career Highlights

Akito Hatano is currently employed at Screen Holdings Co., Ltd., where he continues to innovate and develop advanced substrate processing technologies. His work has been instrumental in improving the efficiency and effectiveness of substrate processing equipment.

Collaborations

Throughout his career, Hatano has collaborated with notable colleagues, including Toyohide Hayashi and Koji Hashimoto. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the field.

Conclusion

Akito Hatano's contributions to substrate processing technology are significant and impactful. His innovative patents and collaborative efforts continue to shape the future of this industry.

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