Akira Okutoh

Title: Akira Okutoh: Innovator in Semiconductor Technology

Introduction

Akira Okutoh is a prominent inventor based in Kobe, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Okutoh's latest patents include a diffusion prevention film and a semiconductor storage device. The diffusion prevention film is constructed of an oxide of aluminum containing barium. By heat-treating this film in a mixed gas atmosphere of oxygen and carbon dioxide, carbon dioxide is adsorbed to the barium. This process effectively restrains the permeation of hydrogen, providing excellent hydrogen barrier properties. When utilized in capacitors, this film contributes to the creation of high-yield semiconductor storage devices with stable ferroelectric characteristics or high dielectric properties. Additionally, his semiconductor memory device prevents deterioration caused by activated hydrogen. An alloy oxide film of platinum and rhodium serves as an upper electrode, improving the hysteresis loop characteristics of dielectric materials and reducing issues such as increased leak current density.

Career Highlights

Okutoh is currently employed at Sharp Kabushiki Kaisha Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced materials that enhance device performance.

Collaborations

Some of his notable coworkers include Yasuyuki Itoh and Masaya Nagata, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Akira Okutoh's contributions to semiconductor technology through his innovative patents have significantly impacted the industry. His work exemplifies the importance of research and development in creating advanced electronic devices.