Location History:
- Machida, JP (1993 - 1996)
- Kanagawa, JP (1997)
- Kawasaki, JP (1997 - 2000)
Company Filing History:
7 out of 39,244 
2 out of 598 
Years Active: 1993-2000
Title: The Innovative Contributions of Akira Oikawa
Introduction
Akira Oikawa is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to the field of resist pattern technology. With a total of eight patents to his name, Oikawa has made remarkable advancements that have influenced various industries.
Latest Patents
Among his latest patents is a method of making resist patterns. This innovative technique involves forming a resist film by coating resist on the surface of a member to be processed. The resist contains a composition capable of increasing its volume through a chemical reaction. The process includes exposing and developing the coated resist film to create a pattern with an opening. Furthermore, a chemically reacting fluid containing a different composition interacts with the initial composition to alter the size of the opening in the resist film. This method allows for the formation of fine resist patterns through a straightforward approach. Another notable patent is the development of a photoresist with a bleaching effect. This exposure technique enhances transparency and minimizes the impact of reflected light in the ultraviolet region of KrF excimer laser light. By utilizing a base polymer with high transparency and a bleaching agent in conjunction with a photo acid generator, this technique effectively reduces reflected light and prevents the formation of eaves in the upper portion of a resist pattern.
Career Highlights
Oikawa has had a distinguished career, working with notable companies such as Fujitsu Corporation and Nippon Zeon Company, Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.
Collaborations
Throughout his career, Oikawa has collaborated with talented individuals, including Hiroyuki Tanaka and Masayuki Oie. These partnerships have fostered a creative environment that has led to groundbreaking advancements in resist technology.
Conclusion
Akira Oikawa's contributions to the field of resist pattern technology are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing technology in this area. Oikawa's work continues to influence the industry and inspire future innovations.