The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 1998
Filed:
Dec. 05, 1995
Applicant:
Inventors:
Akira Oikawa, Kawasaki, JP;
Hiroyuki Tanaka, Kawasaki, JP;
Masayuki Oie, Tokyo, JP;
Hideyuki Tanaka, Tokyo, JP;
Nobunori Abe, Tokyo, JP;
Assignees:
Fujitsu Ltd., Kawasaki, JP;
Nippon Zeon Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430313 ; 430311 ; 430330 ; 430325 ; 430326 ; 4302731 ; 4302711 ;
Abstract
A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically amplified resist, and furthermore, developing the chemically amplified resist after removing the amorphous polyolefines substance.