Location History:
- Kamakura, JP (1987 - 1996)
- Toyama, JP (1997)
- Yokohama, JP (1998)
- Tokyo, JP (1998)
Company Filing History:
Years Active: 1987-1998
Title: The Innovative Contributions of Masayuki Oie
Introduction
Masayuki Oie is a prominent inventor based in Kamakura, Japan. He has made significant contributions to the field of resist compositions and has been awarded 8 patents for his innovative work. His inventions have played a crucial role in advancing technology in various applications.
Latest Patents
One of Oie's latest patents involves a resist composition that comprises a mixture of components. This includes 100 parts by weight of an alkali-soluble phenolic resin, 0.2-50 parts by weight of a compound that forms an acid upon exposure to active rays, and 0.01-50 parts by weight of a compound that crosslinks the alkali-soluble phenolic resin in the presence of the acid. Additionally, sufficient solvent is included to dissolve the composition components. Another patent details a method for forming a chemically amplified resist pattern, which involves applying the resist, forming a layer of an amorphous polyolefines substance, exposing the resist, and developing it after removing the polyolefines substance.
Career Highlights
Throughout his career, Masayuki Oie has worked with notable companies such as Nippon Zeon Company, Ltd. and Fujitsu Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field.
Collaborations
Oie has collaborated with esteemed colleagues, including Takamasa Yamada and Shoji Kawata. These partnerships have fostered a creative environment that has led to the development of advanced technologies.
Conclusion
Masayuki Oie's contributions to the field of resist compositions and his innovative patents highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.