The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 1987

Filed:

Sep. 17, 1985
Applicant:
Inventors:

Masayuki Oie, Kamakura, JP;

Satoshi Ogawa, Tokyo, JP;

Sadao Sugimoto, Yokosuka, JP;

Masahiro Yamazaki, Yokohama, JP;

Katsuhiro Fujino, Kawasaki, JP;

Assignees:

Nippon Zeon Co., Ltd., Tokyo, JP;

Fujitsu Limited, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; C08C / ;
U.S. Cl.
CPC ...
430197 ; 430286 ; 430270 ; 430519 ; 430191 ; 430196 ; 522 26 ; 522 62 ; 522126 ; 522 75 ;
Abstract

A photoresist composition comprising a conjugated diene polymer or its cyclized product, a photocuring agent soluble in an organic solvent and a pyrazole compound having a skeleton represented by the following formula. ##STR1## Also provided is a method of forming a photoresist pattern using the aforesaid composition.


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