This inventor holds 1 USPTO granted patent. Top assignees: Fujitsu Corporation, Nippon Zeon Company, Ltd.. Active years: 1987.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 39,378 
1 out of 598 
Years Active: 1987
Title: Sadao Sugimoto: Innovator in Photoresist Technology
Introduction
Sadao Sugimoto is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the field of photoresist technology, particularly through his innovative patent.
Latest Patents
Sugimoto holds a patent for a photoresist composition that contains a pyrazole compound anti-halation. This composition comprises a conjugated diene polymer or its cyclized product, a photocuring agent soluble in an organic solvent, and a pyrazole compound characterized by a specific chemical structure. Additionally, he has provided a method for forming a photoresist pattern using this composition.
Career Highlights
Throughout his career, Sugimoto has worked with prominent companies, including Nippon Zeon Company, Ltd. and Fujitsu Corporation. His experience in these organizations has allowed him to develop and refine his expertise in photoresist technology.
Collaborations
Sugimoto has collaborated with notable coworkers, including Masayuki Oie and Satoshi Ogawa. Their combined efforts have contributed to advancements in the field.
Conclusion
Sadao Sugimoto's work in photoresist technology exemplifies innovation and dedication. His contributions continue to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile