Akira Motohashi

Title: Akira Motohashi: Innovator in Semiconductor Technology

Introduction

Akira Motohashi is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of innovative manufacturing methods and materials.

Latest Patents

Motohashi holds 2 patents that focus on semiconductor laminated films. His latest patents include a manufacturing method for semiconductor laminated film and a semiconductor laminated film itself. The semiconductor laminate film features a silicon substrate with a semiconductor layer that contains silicon and germanium. This layer is characterized by a surface roughness Rms of 1 nm or less. Additionally, the semiconductor layer adheres to a specific relationship where the thickness (t) is less than or equal to 0.881 times the ratio of germanium atoms to the total number of silicon and germanium atoms in the layer.

The manufacturing method involves forming the semiconductor layer on a silicon substrate using a sputtering method. This method specifies that the film formation temperature should be less than 500°C, with a pressure ranging from 1 mTorr to 11 mTorr. Alternatively, if the temperature is less than 600°C, the pressure should be between 2 mTorr and 5 mTorr. The sputtering process utilizes a gas mixture with less than 0.1% hydrogen, ensuring the semiconductor layer meets the aforementioned thickness relationship.

Career Highlights

Motohashi has worked with esteemed institutions such as the Tokyo University of Agriculture and Technology and the National Institute of Information and Communications Technology. His work in these organizations has furthered advancements in semiconductor research and development.

Collaborations

Motohashi has collaborated with notable colleagues, including Yoshiyuki Suda and Takahiro Tsukamoto. Their joint efforts have contributed to the progress in semiconductor technologies.

Conclusion

Akira Motohashi's innovative work in semiconductor laminated films and manufacturing methods showcases his expertise and dedication to advancing technology in this critical field. His contributions continue to influence the semiconductor industry and inspire future innovations.