Location History:
- Kanagawa, JP (2007)
- Chiba, JP (2015)
- Tokyo, JP (1992 - 2016)
Company Filing History:
6 out of 2,248 
1 out of 131,744 
1 out of 6 Years Active: 1992-2016
Title: Akira Hosomi: Innovator in Semiconductor Technology
Introduction
Akira Hosomi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative work focuses on liquid compositions and methods for fabricating semiconductor devices.
Latest Patents
One of his latest patents is titled "Liquid compositions and methods of fabricating a semiconductor device using the same." This invention provides a liquid composition for etching metal containing copper, which includes hydrogen peroxide and a buffer solution with a pH range of about 4.0 to about 7.0. Another notable patent is "Etchant and method for manufacturing semiconductor device using same." This patent discloses an etchant capable of selectively etching copper without affecting nickel, utilizing a combination of hydrogen peroxide, organic acids, and organic phosphonic acids.
Career Highlights
Throughout his career, Akira Hosomi has worked with notable companies such as Mitsubishi Gas Chemical Company, Inc. and Samsung Electronics Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
He has collaborated with esteemed colleagues, including Yasuo Sugihara and Hidechika Wakabayashi, who have contributed to his research and development efforts.
Conclusion
Akira Hosomi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.