Aichi, Japan

Akio Itamura

This inventor holds 1 USPTO granted patent. Top assignee: C.uyemura Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akio Itamura. Retrieved from https://idiyas.com/inventor/akio-itamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Akio Itamura: Innovator in Electroless Plating Technology.

Introduction

Akio Itamura is a prominent inventor based in Aichi, Japan. He is known for his contributions to the field of electroless plating technology. His innovative work has led to the development of a unique plating film that addresses critical challenges in the industry.

Latest Patents

One of Akio Itamura's notable patents is the Electroless Co—W plating film. The objective of this invention is to provide a new electroless plating film that can prevent the diffusion of molten solder to a metal material constituting a conductor. The electroless Co—W plating film has a tungsten content ranging from 35 to 58 mass % and a thickness of the film of 0.05 μm or more. This innovation is significant for enhancing the reliability of electronic components.

Career Highlights

Akio Itamura is associated with C. Uyemura Co., Ltd., where he has made substantial contributions to the company's research and development efforts. His expertise in plating technology has positioned him as a key figure in advancing the company's product offerings.

Collaborations

Throughout his career, Akio Itamura has collaborated with notable colleagues, including Shoji Iguchi and Shoichi Fukui. These collaborations have fostered a creative environment that has led to further innovations in the field.

Conclusion

Akio Itamura's work in electroless plating technology exemplifies the impact of innovative thinking in addressing industry challenges. His contributions continue to influence advancements in electronic manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…