Fukaya, Japan

Akimitsu Ebihara

USPTO Granted Patents = 53 

 

Average Co-Inventor Count = 1.3

ph-index = 13

Forward Citations = 947(Granted Patents)

Forward Citations (Not Self Cited) = 842(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Kanagawa, JP (1998)
  • Kanagawa-ken, JP (1998 - 2001)
  • San Mateo, CA (US) (1997 - 2002)
  • Nishi kyo-ku, JP (2001 - 2004)
  • Kyoto, JP (2002 - 2004)
  • Kyoto-Fu, JP (2001 - 2005)
  • Nishi kyo, JP (2005 - 2009)
  • Sennangun Osaka, JP (2010)
  • Sennan-gun, JP (2013 - 2014)
  • Osaka, JP (2014)
  • Fukaya, JP (2008 - 2019)

Company Filing History:


Years Active: 1997-2019

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53 patents (USPTO):Explore Patents

Title: Akimitsu Ebihara: Innovator in Exposure Technology

Introduction

Akimitsu Ebihara, a distinguished inventor based in Fukaya, Japan, has made significant contributions to the field of exposure technology. With a remarkable portfolio of 53 patents, Ebihara has established himself as a leading figure in advancing device manufacturing methods, particularly in the realm of semiconductor fabrication.

Latest Patents

Ebihara's most recent patents include an innovative exposure apparatus and device manufacturing method. This apparatus functions by exposing a substrate to illumination light through a liquid. The liquid immersion member of the apparatus features a strategically designed lower surface equipped with multiple collection and supply ports. These ports facilitate the efficient supply of liquid onto the substrate while also allowing for the collection of the liquid, optimizing the exposure process while the substrate is positioned opposite a plane-convex lens of a projection optical system.

Career Highlights

Throughout his career, Akimitsu Ebihara has worked with renowned companies such as Nikon Corporation and Minolta Company, Ltd., gaining invaluable experience in the industry. His expertise and innovative mindset have shaped many processes within these organizations, contributing to advancements in imaging technologies.

Collaborations

Akimitsu has collaborated with talented professionals, including Thomas Novak and W. Thomas Novak. These collaborations have played a crucial role in enhancing the research and development efforts in their respective fields, leading to breakthroughs and new methodologies in exposure technologies.

Conclusion

Akimitsu Ebihara stands out as a prominent inventor whose work continues to influence the semiconductor manufacturing landscape. His persistent innovation and commitment to improving exposure techniques have set a benchmark in the industry, demonstrating the important role of inventors in shaping technological advancements.

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