The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Jun. 16, 2014
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Akimitsu Ebihara, Fukaya, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); Y10T 29/49826 (2015.01); B82Y 10/00 (2013.01); G03F 7/70325 (2013.01); G03F 7/70716 (2013.01); G03F 7/70733 (2013.01); G03F 7/70816 (2013.01);
Abstract

An exposure apparatus exposes a substrate with illumination light via a projection optical system and liquid, and includes a controller that controls movement of first and second movable members each of which can hold a substrate. The controller executes a relative movement between the first and second movable members such that, while one of the movable members is arranged opposed to the projection optical system, the other of the movable members comes close to the one of the movable members, and so as to move the close first and second movable members relative to the projection optical system such that the other of the movable members is arranged opposed to the projection optical system in place of the one of the movable members while substantially maintaining a liquid immersion region under the projection optical system.


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