The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Dec. 28, 2006
Applicant:
Akimitsu Ebihara, Fukaya, JP;
Inventor:
Akimitsu Ebihara, Fukaya, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03B 27/42 (2013.01); G03F 7/70833 (2013.01);
Abstract
An exposure apparatus that forms a pattern by exposing a substrate is equipped with a first platform tower, a second platform tower installed at a predetermined distance, and an exposure main section arranged within the space between both platform towers that includes a plurality of high rigidity sections each including a high rigidity component. Accordingly, it becomes possible to use a module (a high rigidity section) of the preceding generation even when the generation changes.