Kyoto, Japan

Akiko Katsuyama

This inventor holds 21 USPTO granted patents and 1 published patent application, primarily in Pattern Formation Technology. Top assignees: Matsushita Electric Industrial Co., Ltd., Wako Pure Chemical Industries, Inc., Matsushita Electrical Industrial Co., Ltd.. Active years: 1996-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akiko Katsuyama. Retrieved from https://idiyas.com/inventor/akiko-katsuyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 7

Forward Citations = 166(Granted Patents)


Location History:

  • Moriguchi, JP (1996 - 1999)
  • Osaka, JP (1996 - 2001)
  • Takatsuki, JP (2002)
  • Kyoto, JP (2001 - 2004)

Company Filing History:


Years Active: 1996-2004

Loading Chart...
Areas of Expertise:
Pattern Formation
Resist Composition
Surface Treating Agent
Fine Pattern Forming
Cross-Linking Agent
Deep Ultraviolet Light
Pattern Material
Process Method
21 patents (USPTO):Explore Patents

Dear visitor, thank you for your interest in inventor Akiko Katsuyama. Here is the article for you:

Title: Unveiling the Innovations of Akiko Katsuyama from Kyoto

Introduction:

Akiko Katsuyama, a prolific inventor hailing from Kyoto, Japan, has made significant contributions to the field of semiconductor technology. With a total of 21 patents to his name, Katsuyama-san has been at the forefront of developing cutting-edge methodologies for pattern formation in semiconductor manufacturing.

Latest Patents:

Among his recent patents, Akiko Katsuyama has introduced two novel pattern formation methods. The first method involves the application of a resist film on a semiconductor substrate, containing specific atoms or groups for pattern exposure using light within a certain wavelength band. The second method incorporates a base polymer with a sulfonyl group for pattern exposure through a mask. These innovations revolutionize the way resist patterns are formed in semiconductor fabrication processes.

Career Highlights:

Throughout his career, Akiko Katsuyama has showcased his expertise while working at esteemed companies such as Matsushita Electric Industries, Ltd. and Wako Pure Chemical Industries, Inc. His in-depth knowledge and inventive spirit have propelled him to the forefront of the semiconductor industry, where his patents have been instrumental in advancing technology.

Collaborations:

In his pursuits, Katsuyama-san has collaborated with industry peers such as Masayuki Endo and Masaru Sasago. Together, they have synergized their talents and insights to drive innovation and overcome challenges in semiconductor manufacturing, leading to groundbreaking developments in the field.

Conclusion:

In conclusion, Akiko Katsuyama stands as a prominent figure in the realm of semiconductor technology, with a remarkable portfolio of patents that underscore his ingenuity and expertise. His commitment to pushing boundaries and exploring new frontiers continues to inspire and shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…