The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Mar. 10, 2000
Applicant:
Inventors:
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 ; G03F 7/039 ; G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/38 ; G03F 7/039 ; G03F 7/30 ;
Abstract
A resist film is formed by applying, on a semiconductor substrate, a resist material including a base polymer having a sulfonyl group on a main chain. The resist film is irradiated through a mask with exposing light of a wavelength of a 1 nm through 180 nm band for pattern exposure, and the resist film is developed after the pattern exposure, thereby forming a resist pattern.