Company Filing History:
Years Active: 2007-2010
Title: Akiko Igarashi: Innovator in Chemical-Mechanical Polishing
Introduction
Akiko Igarashi is a prominent inventor based in Ibaraki, Japan. She has made significant contributions to the field of chemical-mechanical polishing, holding a total of 3 patents. Her work focuses on developing innovative polishing mediums that enhance the efficiency and effectiveness of substrate polishing processes.
Latest Patents
Among her latest patents is a polishing medium for chemical-mechanical polishing, which includes an oxidizing agent for conductors, a protective-film-forming agent for metal surface protection, an acid, and water. This invention specifies that the polishing medium should have a pH of 3 or less, with the oxidizing agent present in a concentration ranging from 0.01 to 3% by weight. Additionally, the polishing medium may contain abrasive grains with an average particle diameter of 50 nm or less, ensuring a standard deviation of particle size distribution greater than 5 nm.
Career Highlights
Akiko Igarashi is currently employed at Hitachi Chemical Company, Ltd., where she continues to innovate in her field. Her expertise in chemical-mechanical polishing has positioned her as a key figure in the development of advanced polishing technologies.
Collaborations
Throughout her career, Akiko has collaborated with notable colleagues, including Yasushi Kurata and Yasuo Kamigata. These partnerships have contributed to her success and the advancement of her inventions.
Conclusion
Akiko Igarashi's contributions to the field of chemical-mechanical polishing demonstrate her innovative spirit and dedication to advancing technology. Her patents reflect her commitment to improving polishing processes, making her a significant figure in her industry.