The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Aug. 11, 2005
Yasushi Kurata, Ibaraki, JP;
Yasuo Kamigata, Ibaraki, JP;
Takeshi Uchida, Ibaraki, JP;
Hiroki Terasaki, Ibaraki, JP;
Akiko Igarashi, Ibaraki, JP;
Yasushi Kurata, Ibaraki, JP;
Yasuo Kamigata, Ibaraki, JP;
Takeshi Uchida, Ibaraki, JP;
Hiroki Terasaki, Ibaraki, JP;
Akiko Igarashi, Ibaraki, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Abstract
This invention provides a polishing medium for chemical-mechanical polishing, comprising an oxidizing agent for a conductor, a protective-film-forming agent for protecting a metal surface, an acid, and water; (1) the polishing medium having a pH of 3 or less, and the oxidizing agent being in a concentration of from 0.01 to 3% by weight, or (2) the polishing medium containing abrasive grains having an average particle diameter of 50 nm or less, and the abrasive grains having standard deviation of particle size distribution in a value of more than 5 nm.