Location History:
- Tsukuba, JP (1999)
- Ibaraki, JP (2007 - 2010)
Company Filing History:
Years Active: 1999-2010
Title: Hiroki Terasaki: Innovator in Chemical-Mechanical Polishing
Introduction
Hiroki Terasaki is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of chemical-mechanical polishing, holding a total of 4 patents. His work focuses on developing innovative polishing mediums that enhance the efficiency and effectiveness of substrate polishing processes.
Latest Patents
One of Hiroki Terasaki's latest patents is a polishing medium for chemical-mechanical polishing, which includes an oxidizing agent for conductors, a protective-film-forming agent for metal surface protection, an acid, and water. This invention specifies that the polishing medium should have a pH of 3 or less, with the oxidizing agent present in a concentration ranging from 0.01 to 3% by weight. Additionally, the polishing medium may contain abrasive grains with an average particle diameter of 50 nm or less, ensuring a standard deviation of particle size distribution greater than 5 nm.
Career Highlights
Hiroki Terasaki is currently employed at Hitachi Chemical Company, Ltd., where he continues to innovate in the field of chemical-mechanical polishing. His expertise and dedication to research have led to advancements that benefit various industries reliant on precise substrate polishing techniques.
Collaborations
Hiroki has collaborated with esteemed colleagues such as Yasushi Kurata and Yasuo Kamigata. Their combined efforts have contributed to the development of cutting-edge technologies in the polishing medium sector.
Conclusion
Hiroki Terasaki's contributions to the field of chemical-mechanical polishing exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in polishing processes, making him a valuable asset to the industry.