Miyagi, Japan

Akihito Fushimi

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2018-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihito Fushimi. Retrieved from https://idiyas.com/inventor/akihito-fushimi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2022

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4 patents (USPTO):Explore Patents

Title: Akihito Fushimi: Innovator in Plasma Processing Technology

Introduction

Akihito Fushimi is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His innovative work has advanced the methods and apparatus used in etching processes, which are crucial in various manufacturing applications.

Latest Patents

Fushimi's latest patents include an etching method and a plasma processing apparatus. The etching method utilizes a plasma processing apparatus that features a processing chamber with a support stage for accommodating a substrate. This method involves adjusting the dielectric constant in the space between the substrate and the support stage using a first annular member, which is essential for effective etching. The plasma processing apparatus is designed to process a target object within a depressurized space, incorporating a mounting table with an electrostatic chuck and three electrodes to enhance the adsorption of the target object.

Career Highlights

Fushimi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has positioned him as a key player in the development of advanced plasma processing technologies. His contributions have not only improved existing processes but have also paved the way for future innovations in the field.

Collaborations

Throughout his career, Fushimi has collaborated with notable colleagues, including Yasuharu Sasaki and Fumiaki Ariyoshi. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Akihito Fushimi's work in plasma processing technology exemplifies the impact of innovation in the semiconductor industry. His patents and contributions continue to influence the field, showcasing the importance of research and development in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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