This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2010-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Mito, JP (2010 - 2015)
- Tokyo, JP (2020)
Company Filing History:
Years Active: 2010-2020
Title: Akihiro Onizawa: Innovator in Pattern Measurement Technology
Introduction
Akihiro Onizawa is a notable inventor based in Mito, Japan. He has made significant contributions to the field of pattern measurement technology, holding a total of 4 patents. His work focuses on developing devices and programs that enhance the accuracy and efficiency of pattern measurement processes.
Latest Patents
Onizawa's latest patents include a pattern measurement device and a computer program for measuring patterns. The pattern measurement device aims to evaluate patterns formed by methods that do not utilize a photomask. This invention features a computation device that measures dimensions between patterns on a sample. It extracts the centroid of the pattern from data obtained through beam irradiation and executes a position alignment process with measurement reference data. The device measures the dimensions between the measurement reference data and the edges or centroids of the patterns.
The second patent involves a technique for global alignment using multiple alignment pattern candidates. This method allows for stable and automatic detection of position shifts and rotations of a wafer using an optical microscope. By calculating multiple alignment pattern candidates and creating matching data for each, the technique performs matching based on image signals from the optical microscope. The results enable the calculation of position shifts and rotations of the wafer.
Career Highlights
Onizawa is currently employed at Hitachi High-Technologies Corporation, where he continues to innovate in the field of pattern measurement. His work has been instrumental in advancing technologies that are crucial for various applications in semiconductor manufacturing and other industries.
Collaborations
Some of his notable coworkers include Akiyuki Sugiyama and Ryoichi Matsuoka. Their collaborative efforts contribute to the ongoing development of cutting-edge technologies in their field.
Conclusion
Akihiro Onizawa's contributions to pattern measurement technology exemplify the impact of innovative thinking in advancing industrial processes. His patents reflect a commitment to enhancing measurement accuracy and efficiency, making significant strides in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile