The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Nov. 22, 2011
Atsushi Miyamoto, Yokohama, JP;
Naoki Hosoya, Tokyo, JP;
Toshikazu Kawahara, Hitachinaka, JP;
Akihiro Onizawa, Mito, JP;
Atsushi Miyamoto, Yokohama, JP;
Naoki Hosoya, Tokyo, JP;
Toshikazu Kawahara, Hitachinaka, JP;
Akihiro Onizawa, Mito, JP;
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Abstract
In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (), multiple data for matching are created for each alignment pattern (), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image () based on an image signal from the optical microscope (), and the amount of position shift and the amount of rotation of the wafer are calculated () on the basis of the results of matching ().