Yokohama, Japan

Akihiko Yokoyama

This inventor holds 4 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 1995-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiko Yokoyama. Retrieved from https://idiyas.com/inventor/akihiko-yokoyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 1995-1999

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4 patents (USPTO):Explore Patents

Title: Akihiko Yokoyama: Innovator in Thin Film Technology

Introduction

Akihiko Yokoyama is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His work focuses on innovative methods for film formation, which have applications in various industries.

Latest Patents

Yokoyama's latest patents include a film forming method and apparatus designed for the formation of thin films on both surfaces of substrates, such as lenses. This method utilizes a pair of cluster beam evaporation sources that are positioned separately within a film forming chamber. The substrate is strategically placed between these sources to optimize the film formation process. Another notable patent is a cluster beam deposition method for manufacturing thin films. This method generates evaporated particles from a vapor source, clusters them, and deposits them onto a substrate in a vacuum atmosphere. The process is carefully controlled to maintain a partial pressure of water not exceeding 5 × 10⁻⁶ Torr, while keeping the substrate temperature at or below 150°C. This innovative approach results in films with high adhesion characteristics and mechanical strength without damaging the substrate.

Career Highlights

Yokoyama is currently employed at Canon Kabushiki Kaisha, where he continues to advance his research and development in thin film technologies. His work has garnered attention for its potential to enhance the performance and durability of various optical and electronic devices.

Collaborations

Throughout his career, Yokoyama has collaborated with notable colleagues, including Hidehiko Fujimura and Mitsuharu Sawamura. These collaborations have contributed to the advancement of their shared research interests and have led to further innovations in their respective fields.

Conclusion

Akihiko Yokoyama's contributions to thin film technology exemplify the impact of innovative thinking in the field of materials science. His patents reflect a commitment to enhancing manufacturing processes and improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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