The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1999
Filed:
Jan. 10, 1997
Hidehiko Fujimura, Yokohama, JP;
Mitsuharu Sawamura, Yokohama, JP;
Makoto Kameyama, Funabashi, JP;
Akihiko Yokoyama, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In formation of thin films on both surfaces of a substrate such as a lens or the like, a pair of cluster beam evaporation sources are provided in mutually separate manner in a film forming chamber. The substrate is disposed between the pair of cluster beam evaporation sources. The cluster beam evaporation source includes a crucible which is arranged to be inclined toward the substrate, or which has a nozzle on a lateral face opposed to the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile