Location History:
- Isehara, JP (1999 - 2000)
- Sagamihara, JP (2001)
- Nirasaki, JP (2008)
Company Filing History:
Years Active: 1999-2008
Title: Akihiko Tsukada: Innovator in Semiconductor Processing Technology
Introduction
Akihiko Tsukada is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor processing technology, holding a total of four patents. His work focuses on enhancing the efficiency and accuracy of film processing devices.
Latest Patents
One of Tsukada's latest patents is a processing device and method for maintaining the device. This innovative film processing device utilizes a vaporized liquid source and is capable of confirming the flow control accuracy of equipment such as mass flow controllers. The design includes a bypass passage for washing fluid, allowing for effective maintenance without the need to disassemble piping. Another notable patent is for an MOCVD system, which is designed for forming tantalum oxide films on semiconductor wafers. This system employs pentoethoxytantalum as a liquid raw material and features a temperature-controlled environment to ensure optimal processing conditions.
Career Highlights
Tsukada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work has been instrumental in advancing technologies that improve the production processes of semiconductor devices.
Collaborations
Throughout his career, Tsukada has collaborated with notable colleagues, including Kouji Shimomura and Kazunari Sakata. These partnerships have contributed to the development of innovative solutions in semiconductor processing.
Conclusion
Akihiko Tsukada's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.