Akihiko Mitsuda

Title: Akihiko Mitsuda: Innovator in Plasma Processing Technology

Introduction

Akihiko Mitsuda is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing method that enhances the etching of nonvolatile materials.

Latest Patents

Mitsuda holds a patent for a plasma processing method. This method involves supplying a processing gas to a vacuum vessel, where a plasma is produced using an antenna and a Faraday shield. A high-frequency electric power is applied to these components, allowing for effective processing. Notably, a voltage of at least 500 V is applied to the Faraday shield, enabling the etching of a sample within the vacuum vessel.

Career Highlights

Akihiko Mitsuda is associated with Hitachi High-Technologies Corporation, where he continues to advance his research and development efforts. His work in plasma processing has positioned him as a key figure in the industry, contributing to technological advancements that benefit various applications.

Collaborations

Mitsuda has collaborated with esteemed colleagues such as Tadayoshi Kawaguchi and Tadamitsu Kanekiyo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Akihiko Mitsuda's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patent and ongoing work at Hitachi High-Technologies Corporation highlight his role as a leading inventor in this specialized field.