The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Oct. 21, 2003
Tadayoshi Kawaguchi, Kudamatsu, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Akihiko Mitsuda, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Saburou Kanai, Hikari, JP;
Tadayoshi Kawaguchi, Kudamatsu, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Akihiko Mitsuda, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Saburou Kanai, Hikari, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In a plasma processing method which comprises supplying a processing gas to a vacuum vessel forming a plasma production part, producing a plasma using an antenna and a Faraday shield which are provided at outer periphery of the vacuum vessel and to which a high-frequency electric power can be applied, and carrying out the processing, a voltage of at least 500 V is applied to the Faraday shield and a sample which is disposed in the vacuum vessel and which is a nonvolatile material as a material to be etched is etched.