Hitachi-High-Technologies Corporation

Akihiko Mitsuda

Takeshi Shimada

Saburou Kanai

Tadamitsu Kanekiyo

Tadayoshi Kawaguchi

In a plasma processing method which comprises supplying a processing gas to a vacuum vessel forming a plasma production part, producing a plasma using an antenna and a Faraday shield which are provided at outer periphery of the vacuum vessel and to which a high-frequency electric power can be applied, and carrying out the processing, a voltage of at least 500 V is applied to the Faraday shield and a sample which is disposed in the vacuum vessel and which is a nonvolatile material as a material to be etched is etched.

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Kudamatsu, Japan

Akihiko Mitsuda