Helmond, Netherlands

Adrianus Hubertus Henricus Van Dijk

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adrianus Hubertus Henricus Van Dijk. Retrieved from https://idiyas.com/inventor/adrianus-hubertus-henricus-van-dijk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Inventor Spotlight: Adrianus Hubertus Henricus Van Dijk

Introduction:

Adrianus Hubertus Henricus Van Dijk, a talented inventor hailing from Helmond, NL, has made significant contributions to the field of radiation exposure apparatus. With a keen eye for innovation, Van Dijk's work has pushed the boundaries of technology in the industry.

Latest Patents:

Van Dijk holds a single patent titled "Radiation exposure apparatus comprising a gas flushing system." This groundbreaking invention features an exposure apparatus equipped with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system designed to remove gas from the space between the projection system and the substrate.

Career Highlights:

Van Dijk is affiliated with ASML Netherlands B.V., a prominent company in the innovation and technology sector. His role at ASML Netherlands B.V. showcases his expertise and dedication to advancing cutting-edge technologies in the field.

Collaborations:

Throughout his career, Van Dijk has collaborated with esteemed colleagues such as Klaus Simon and Enno Van Den Brink. Together, they have worked on projects that have furthered the development of innovative solutions in the industry.

Conclusion:

In conclusion, Adrianus Hubertus Henricus Van Dijk stands out as a remarkable inventor whose inventive spirit and dedication have led to groundbreaking advancements in the field of radiation exposure apparatus. His patent and collaborations highlight his commitment to driving innovation and shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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