The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Dec. 06, 2005
Applicants:
Klaus Simon, Eindhoven, NL;
Enno Van Den Brink, Eindhoven, NL;
Gerardus Johannes Joseph Keijsers, Venlo, NL;
Adrianus Hubertus Henricus Van Dijk, Helmond, NL;
Hubertus Antonius Marinus Baijens, Mierlo, NL;
Inventors:
Klaus Simon, Eindhoven, NL;
Enno Van Den Brink, Eindhoven, NL;
Gerardus Johannes Joseph Keijsers, Venlo, NL;
Adrianus Hubertus Henricus Van Dijk, Helmond, NL;
Hubertus Antonius Marinus Baijens, Mierlo, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.