This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Abyaya Dhar: Innovator in Image Analytics for Substrate Processing
Introduction
Abyaya Dhar is a prominent inventor based in Bengaluru, India. He has made significant contributions to the field of image analytics, particularly in substrate processing systems. With a total of 2 patents, his work focuses on enhancing the efficiency and reliability of manufacturing processes.
Latest Patents
Abyaya Dhar's latest patents include innovative methods for edge defect detection and clog detection via image analytics. The first patent, titled "Edge defect detection via image analytics," involves identifying images of edges in a susceptor pocket formed by a substrate processing system. This method predicts whether the property values of the edge meet specific threshold values and initiates corrective actions when necessary. The second patent, "Clog detection via image analytics," describes a method for identifying images of substrate processing equipment parts with multiple holes. This method determines the angular distance and area of each hole to identify clogs, allowing for timely corrective actions.
Career Highlights
Abyaya Dhar is currently employed at Applied Materials, Inc., where he applies his expertise in image analytics to improve substrate processing technologies. His innovative approaches have the potential to significantly enhance manufacturing efficiency and product quality.
Collaborations
Abyaya collaborates with talented coworkers, including Yash Chhabra and Sidda Reddy Kurakula, who contribute to the development of advanced technologies in their field.
Conclusion
Abyaya Dhar's contributions to image analytics in substrate processing highlight his role as an influential inventor. His patents reflect a commitment to innovation and improvement in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
