Boise, ID, United States of America

Aaron W Freese

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Micron Technology Incorporated. Active years: 2020-2022.


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Innovations of Aaron W Freese

Introduction

Aaron W Freese is an accomplished inventor based in Boise, ID (US). He has made significant contributions to the field of integrated circuits and has been awarded 2 patents for his innovative work. His expertise lies in the construction of integrated circuitry, which plays a crucial role in modern electronics.

Latest Patents

Freese's latest patents focus on a method of forming an array that utilizes two different composition masking materials. This method involves creating a pattern of spaced repeating first features that are substantially the same size and shape. Additionally, a pattern-interrupting second feature, which differs in size or shape, is integrated within the first features. The process translates these patterns into lower substrate material, allowing for precise analysis and reference location determination. This innovative approach enhances the efficiency and accuracy of integrated circuit construction.

Career Highlights

Freese is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to collaborate with other talented professionals, further advancing the field of integrated circuitry.

Collaborations

Some of his notable coworkers include Gurpreet S Lugani and Kyle B Campbell, who contribute to the innovative environment at Micron Technology.

Conclusion

Aaron W Freese's contributions to integrated circuit technology exemplify the spirit of innovation in the field. His patents reflect a deep understanding of complex processes and a commitment to advancing technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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