This inventor holds 1 USPTO granted patent. Top assignee: Cmc Materials, Inc.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: The Innovations of Aaron Peterson
Introduction
Aaron Peterson is an accomplished inventor based in Portland, OR. He has made significant contributions to the field of chemical-mechanical polishing. His innovative work has led to the development of a unique subpad that enhances the polishing process.
Latest Patents
Aaron holds a patent for a "Chemical-mechanical polishing subpad having porogens with polymeric shells." This invention involves a subpad designed for chemical-mechanical polishing pads, featuring porogens with polymeric shells. The patent also describes methods for fabricating the subpad and polishing pads with a polishing surface layer bonded to the subpad layer.
Career Highlights
Aaron is currently employed at CMC Materials, Inc., where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing the technology used in chemical-mechanical polishing.
Collaborations
Aaron collaborates with talented individuals such as Dustin Miller and Paul Andre Lefevre. Their combined expertise fosters a creative environment that drives innovation.
Conclusion
Aaron Peterson's contributions to the field of chemical-mechanical polishing exemplify the spirit of innovation. His patent and ongoing work at CMC Materials, Inc. highlight his commitment to advancing technology in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile