The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Dec. 21, 2021
Applicant:
Cmc Materials, Inc., Aurora, IL (US);
Inventors:
Dustin Miller, Beaverton, OR (US);
Paul Andre Lefevre, Portland, OR (US);
Aaron Peterson, Portland, OR (US);
Chen-Chih Tsai, Naperville, IL (US);
Assignee:
CMC MATERIALS LLC, Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); B24D 3/32 (2006.01); B29C 44/02 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24D 3/32 (2013.01); B29C 44/02 (2013.01);
Abstract
A subpad for a chemical-mechanical polishing pad, the subpad having porogens with polymeric shells. Methods of fabricating the subpad and polishing pads with a polishing surface layer bonded to the subpad layer are also described.