A Gary Reid

Title: A Gary Reid: Innovator in Lithographic Technologies

Introduction

A Gary Reid is a notable inventor based in Burlington, VT (US), recognized for his contributions to lithographic technologies. With a total of 4 patents, Reid has made significant advancements in the field, particularly in the development of mask substrate structures and photoresist trimming processes.

Latest Patents

One of Reid's latest patents is focused on a mask substrate structure. This innovation relates to lithographic masks and includes a sub-resolution assist feature (SRAF) formed on a quartz substrate. The mask is composed of a patterned transition film and an absorber layer, enhancing the precision of lithographic processes. Another significant patent involves a photoresist trimming process. This process introduces a photoresist trimming gas compound that selectively removes resist foot or scum from the lower portions of sidewalls of a photoresist. The trimmer compound not only hardens the upper surface of the photoresist but also strengthens it, making it more effective during dry etching processes.

Career Highlights

Throughout his career, A Gary Reid has worked with prominent companies such as IBM and Globalfoundries Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in lithography.

Collaborations

Reid has collaborated with talented individuals in the industry, including Shaun Crawford and Cuc Kim Huynh. These partnerships have fostered a creative environment that has led to the development of his innovative patents.

Conclusion

A Gary Reid's work in lithographic technologies showcases his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in lithography, making him a valuable contributor to the field.