The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Jun. 20, 2016
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Richard Wistrom, Essex Junction, VT (US);
Mark S. Lawliss, Essex Junction, VT (US);
A. Gary Reid, Burlington, VT (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/26 (2012.01); G03F 1/36 (2012.01); G03F 1/38 (2012.01); G03F 1/54 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/26 (2013.01); G03F 1/36 (2013.01); G03F 1/38 (2013.01); G03F 1/54 (2013.01); G03F 1/80 (2013.01);
Abstract
The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.