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EPO Patents = 3

Trademarks = 2

Forward Citations = 74

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5 inventors (with patents filed for the assignee):

Daniel Theodore Crowley (9 out of 16 patents)

Patrick Lawrence Morse (6 out of 10 patents)

William A Meredith, Jr (4 out of 11 patents)

4. John Robert German (3 out of 3 patents)

5. Michelle Lynn Neal (1 out of 1 patent)

11 patents: Sort by Forward Citations

1. 10727034 - Magnetic force release for sputtering sources with magnetic target materials (2020-07-28),

2. RE46599 - Sputtering apparatus (2017-11-06),

3. 9758862 - Sputtering apparatus (2017-09-12),

4. 9418823 - Sputtering apparatus (2016-08-16),

5. 9406487 - Plasma enhanced chemical vapor deposition (PECVD) source (2016-08-02),

6. 9312108 - Sputtering apparatus (2016-04-12),

7. 9198274 - Ion control for a plasma source (2015-11-24),

8. 8900428 - Sputtering apparatus (2014-12-02),

9. 8182662 - Rotary cathode for magnetron sputtering apparatus (2012-05-22),

10. 6905579 - Cylindrical magnetron target and spindle apparatus (2005-06-14),

11. 6841051 - High-power ion sputtering magnetron (2005-01-11),

Sputtering Components, Inc. is a leading provider of innovative sputtering solutions for the semiconductor and thin-film industries. With over 30 years of experience, we specialize in the design and manufacturing of high-performance sputtering magnetron sources and power supplies. Our cutting-edge technology and superior products enable our customers to achieve enhanced productivity, efficiency, and quality in their thin-film deposition processes. Sputtering Components, Inc. is committed to delivering reliable, cost-effective, and environmentally-friendly solutions that meet the evolving needs of the industry.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 15 2026

11 Patents

#13 in Owatonna, MN

#786 in Minnesota

#27,450 in US

#51,622 in the World

Owatonna, MN, United States of America

Sputtering Components, Inc.