The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Jul. 01, 2013
Applicant:

Sputtering Components, Inc., Owatonna, MN (US);

Inventor:

Patrick Lawrence Morse, Tuscon, AZ (US);

Assignee:

Sputtering Components, Inc., Owatonna, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/48 (2006.01); H01J 37/32 (2006.01); C23C 16/515 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01); C23C 16/486 (2013.01); C23C 16/515 (2013.01); H01J 37/32027 (2013.01); H01J 37/32146 (2013.01); H05H 2001/4682 (2013.01);
Abstract

One embodiment is directed to a plasma source comprising a cavity and at least first and second electrodes. The plasma source is configured to, during a first portion of each cycle, bias the first electrode as a cathode and use the second electrode as an anode, during a second portion of each cycle, apply an ion flush bias to the first and second electrodes, during a third portion of each cycle, bias the second electrode as a cathode and use the first electrode as an anode, and during a fourth portion of each cycle, apply an ion flush bias to the first and second electrodes. Other embodiments are disclosed.


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